Stainless Steel Shadow Mask
Shadow masks are essential tools for defining device areas and forming micro‑structures with high precision by selectively masking or covering target surfaces. Traditional patterning of silicon wafers and substrates typically relies on photolithography or direct‑write lithography.
At YMJ Optical, we offer laser‑manufactured shadow masks — a rapid, cost‑effective alternative to photolithography for applications where feature sizes are ≥ 25μm.
Advantages of Laser‑Manufactured Shadow Masks
Compared to conventional chemical etching, our laser fabrication process delivers:
Smaller geometries
Sharper edge definition
Tighter dimensional tolerances
Additionally, laser processing enables the use of unconventional materials, eliminating risks of
chemical contamination or unwanted reactions in sensitive deposition processes.
Technical Specifications & Capabilities
| Parameter | Capability | Notes |
|---|---|---|
| Minimum Pattern Width | ≥ 20μm | Application dependent |
| Process Tolerance | ± 10μm | Application dependent; can be optimized for specific designs |
| Material Compatibility | Stainless steel, nickel alloys, specialty metals, polymers, and more | Supports unconventional materials to avoid chemical contamination |
| Edge Quality | Burr‑free, minimal heat‑affected zone (HAZ) | Femtosecond laser process available for ultra‑precision applications |
Optional Features
To facilitate handling, alignment, and seamless integration into production workflows, we can
fabricate:
Mechanical supports
Carrier frames
These features assist in precise alignment of shadow masks to target device features, improving yield and repeatability.
Typical Applications
Semiconductor device patterning
MEMS (Micro‑Electro‑Mechanical Systems) fabrication
Thin‑film deposition (OLED, solar cells, sensors)
R&D prototyping and low‑to‑medium volume production
Why Choose YMJ Optical?
High‑precision laser processing — Femtosecond and nanosecond laser platforms to support everything from R&D prototyping to low‑volume production.
Material flexibility — Process unconventional materials that are difficult or impossible with
traditional photolithography, eliminating chemical contamination risks.
Rapid turnaround — No photomask fabrication lead time; significantly shorter prototype validation cycles.
Customized solutions — One‑stop service from pattern design to carrier frame integration.
Contact Us
Need custom shadow masks for your next project?
Contact YMJ Optical to discuss your specifications, materials, and volume requirements.
